Publication:
Application of Cl2 for low temperature etch and epitaxy
Date
| dc.contributor.author | Hikavyy, Andriy | |
| dc.contributor.author | Porret, Clément | |
| dc.contributor.author | Rosseel, Erik | |
| dc.contributor.author | Milenin, Alexey | |
| dc.contributor.author | Loo, Roger | |
| dc.contributor.imecauthor | Hikavyy, Andriy | |
| dc.contributor.imecauthor | Porret, Clément | |
| dc.contributor.imecauthor | Rosseel, Erik | |
| dc.contributor.imecauthor | Milenin, Alexey | |
| dc.contributor.imecauthor | Loo, Roger | |
| dc.contributor.orcidimec | Hikavyy, Andriy::0000-0002-8201-075X | |
| dc.contributor.orcidimec | Porret, Clément::0000-0002-4561-348X | |
| dc.contributor.orcidimec | Milenin, Alexey::0000-0003-0747-0462 | |
| dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
| dc.date.accessioned | 2021-10-27T10:29:42Z | |
| dc.date.available | 2021-10-27T10:29:42Z | |
| dc.date.issued | 2019 | |
| dc.identifier.issn | 0268-1242 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/33162 | |
| dc.identifier.url | https://iopscience.iop.org/article/10.1088/1361-6641/aafc93 | |
| dc.source.beginpage | 74003 | |
| dc.source.issue | 7 | |
| dc.source.journal | Semiconductor Science and Technology | |
| dc.source.volume | 34 | |
| dc.title | Application of Cl2 for low temperature etch and epitaxy | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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