Publication:
The impact of airborne molecular bases on DUV photoresists
Date
| dc.contributor.author | Ruede, D. | |
| dc.contributor.author | Ercken, Monique | |
| dc.contributor.author | Borgers, Tom | |
| dc.contributor.imecauthor | Ercken, Monique | |
| dc.contributor.imecauthor | Borgers, Tom | |
| dc.contributor.orcidimec | Borgers, Tom::0000-0002-7878-6977 | |
| dc.date.accessioned | 2021-10-14T17:44:35Z | |
| dc.date.available | 2021-10-14T17:44:35Z | |
| dc.date.issued | 2001 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5626 | |
| dc.source.beginpage | 63 | |
| dc.source.endpage | 70 | |
| dc.source.issue | 8 | |
| dc.source.journal | Solid State Technology | |
| dc.source.volume | 44 | |
| dc.title | The impact of airborne molecular bases on DUV photoresists | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |