Publication:

Critical pattern behavior at nanometer scale vicinity of black border

Date

2019
Presentation
Simple item page Full metadata Statistics
 
dc.contributor.authorKovalevich, Tatiana
dc.contributor.authorBekaert, Joost
dc.contributor.authorWiaux, Vincent
dc.contributor.authorLiddle, Jack
dc.contributor.authorDavydova, Natalia
dc.contributor.authorTien, Ming-Chun
dc.contributor.imecauthorKovalevich, Tatiana
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorLiddle, Jack
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.accessioned2021-10-27T11:44:00Z
dc.date.available2021-10-27T11:44:00Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33326
dc.source.conference17th Fraunhofer IISB Lithography Simulation Workshop
dc.source.conferencedate26/09/2019
dc.source.conferencelocationBehringersmuhle Germany
dc.title

Critical pattern behavior at nanometer scale vicinity of black border

dc.typeOral presentation
dspace.entity.typePublication
Files
Publication available in collections:
Presentations