Publication:

Characterizing immersion lithography micro bridge defects using advanced features of teh SEMVision G3 STAR FIB

Date

2009
Proceedings Paper
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dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorSantoro, Gaetano
dc.contributor.authorGronheid, Roel
dc.contributor.authorBraggin, Jennifer
dc.contributor.authorRosslee, Craig
dc.contributor.authorLeray, Philippe
dc.contributor.authorCheng, Shaunee
dc.contributor.authorSchreutelkamp, Rob
dc.contributor.authorHillel, Noam
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorSantoro, Gaetano
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorLeray, Philippe
dc.date.accessioned2021-10-18T04:01:37Z
dc.date.available2021-10-18T04:01:37Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16367
dc.source.conference6th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/10/2009
dc.source.conferencelocationPrague Czech Republic
dc.title

Characterizing immersion lithography micro bridge defects using advanced features of teh SEMVision G3 STAR FIB

dc.typeProceedings paper
dspace.entity.typePublication
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