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Development of main chain scission type photoresists for EUV lithography
Publication:
Development of main chain scission type photoresists for EUV lithography
Date
2019
Proceedings Paper
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43945.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Shirotori, Akihide
;
Vesters, Yannick
;
Hoshino, Manabu
;
Rathore, Ashish
;
De Simone, Danilo
;
Vandenberghe, Geert
;
Matsumoto, Hirokazu
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1977
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item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations
Metrics
Views
1977
since deposited on 2021-10-27
467
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations