Publication:

High-Performance and Industrially Viable Nanostructured SiOx Layers for Interface Passivation in Thin Film Solar Cells

Date

2021
Journal article
https://doi.org/10.1002/solr.202000534
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dc.contributor.authorCunha, Jose M. V.
dc.contributor.authorOliveira, Kevin
dc.contributor.authorLontchi, Jackson
dc.contributor.authorSousa Lopes, Tomas
dc.contributor.authorCurado, Marco A.
dc.contributor.authorBarbosa, Joao R. S.
dc.contributor.authorVinhais, Carlos
dc.contributor.authorChen, Wei-Chao
dc.contributor.authorBorme, Jerome
dc.contributor.authorFonseca, Helder
dc.contributor.authorGaspar, Joao
dc.contributor.authorFlandre, Denis
dc.contributor.authorEdoff, Marika
dc.contributor.authorSilva, Ana G.
dc.contributor.authorTeixeira, Jennifer P.
dc.contributor.authorFernandes, Paulo A.
dc.contributor.authorSalome, Pedro M. P.
dc.contributor.imecauthorSousa Lopes, Tomas
dc.contributor.orcidextCunha, Jose M. V.::0000-0002-1622-0193
dc.contributor.orcidextBarbosa, Joao R. S.::0000-0002-9840-9327
dc.contributor.orcidextBorme, Jerome::0000-0002-5622-7760
dc.contributor.orcidextGaspar, Joao::0000-0002-6358-8951
dc.contributor.orcidextSalome, Pedro M. P.::0000-0002-1050-2958
dc.contributor.orcidimecLopes, Tomas S.::0000-0002-1266-386X
dc.date.accessioned2022-02-25T09:47:10Z
dc.date.available2022-02-25T09:47:10Z
dc.date.issued2021
dc.identifier.doi10.1002/solr.202000534
dc.identifier.issn2367-198X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39140
dc.publisherWILEY-V C H VERLAG GMBH
dc.source.beginpage200534
dc.source.issue3
dc.source.journalSOLAR RRL
dc.source.numberofpages13
dc.source.volume5
dc.title

High-Performance and Industrially Viable Nanostructured SiOx Layers for Interface Passivation in Thin Film Solar Cells

dc.typeJournal article
dspace.entity.typePublication
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