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Semi-empirical interconnect resistance model for advanced technology nodes

Date

2016
Proceedings Paper
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dc.contributor.authorRoussel, Philippe
dc.contributor.authorCiofi, Ivan
dc.contributor.authorDegraeve, Robin
dc.contributor.authorVega Gonzalez, Victor
dc.contributor.authorJourdan, Nicolas
dc.contributor.authorBaert, Rogier
dc.contributor.authorLinten, Dimitri
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorTokei, Zsolt
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorThean, Aaron
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorVega Gonzalez, Victor
dc.contributor.imecauthorJourdan, Nicolas
dc.contributor.imecauthorBaert, Rogier
dc.contributor.imecauthorLinten, Dimitri
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecLinten, Dimitri::0000-0001-8434-1838
dc.contributor.orcidimecGroeseneken, Guido::0000-0003-3763-2098
dc.date.accessioned2021-10-23T14:25:58Z
dc.date.available2021-10-23T14:25:58Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27245
dc.source.beginpageIT-2
dc.source.conferenceIEEE International Reliability Physics Conference - IRPS
dc.source.conferencedate17/04/2016
dc.source.conferencelocationPasadena, CA USA
dc.title

Semi-empirical interconnect resistance model for advanced technology nodes

dc.typeProceedings paper
dspace.entity.typePublication
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