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Sub-0.25 micron lithography applying illumination pupil filtering (quadrupole) on a DUV step-and-repeat system

Date

1998
Proceedings Paper
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dc.contributor.authorFinders, Jo
dc.contributor.authorMulders, A. M.
dc.contributor.authorKrist, J.
dc.contributor.authorFlagello, D.
dc.contributor.authorLuehrmann, P.
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorMarschner, Thomas
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorRonse, Kurt
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorRonse, Kurt
dc.date.accessioned2021-09-30T11:57:19Z
dc.date.available2021-09-30T11:57:19Z
dc.date.embargo9999-12-31
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2573
dc.source.beginpage81
dc.source.conferenceOLIN Microlithography Symposium. Interface '98
dc.source.conferencedate15/11/1998
dc.source.conferencelocationSan Diego, CA USA
dc.source.endpage92
dc.title

Sub-0.25 micron lithography applying illumination pupil filtering (quadrupole) on a DUV step-and-repeat system

dc.typeProceedings paper
dspace.entity.typePublication
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