Publication:

E-beam direct write using a chemically amplified negative tone resist

Date

1994
Proceedings Paper
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dc.contributor.authorSeabra, Antonio C.
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan den hove, Luc
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.accessioned2021-09-29T12:42:31Z
dc.date.available2021-09-29T12:42:31Z
dc.date.embargo9999-12-31
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/209
dc.source.beginpage680
dc.source.conferenceIX Congresso da Sociedade Brasileira de Microelectronica - IX SBMICRO
dc.source.conferencedate08/08/1994
dc.source.conferencelocationRio de Janeiro Brazil
dc.source.endpage685
dc.title

E-beam direct write using a chemically amplified negative tone resist

dc.typeProceedings paper
dspace.entity.typePublication
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