Publication:

Vapor phase decomposition - droplet collection: Evalutation of a wafer surface preparation system

Date

1999
Meeting abstract
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dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorArnauts, Sophia
dc.contributor.authorWitters, Thomas
dc.contributor.authorRink, I.
dc.contributor.authorWortelboer, R.
dc.contributor.authorHuber, A.
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-10-06T10:54:32Z
dc.date.available2021-10-06T10:54:32Z
dc.date.embargo9999-12-31
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3351
dc.source.beginpage1125
dc.source.conferenceElectrochemical Society Fall Meeting: 6th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate17/10/1999
dc.source.conferencelocationHonolulu, HI USA
dc.title

Vapor phase decomposition - droplet collection: Evalutation of a wafer surface preparation system

dc.typeMeeting abstract
dspace.entity.typePublication
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