Publication:

EUV mask defectivity – A process of increasing control towards HVM

Date

2017
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorJonckheere, Rik
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.accessioned2021-10-24T06:24:04Z
dc.date.available2021-10-24T06:24:04Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.issn2192-8584
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28608
dc.identifier.urlhttps://www.degruyter.com/view/j/aot.2017.6.issue-3-4/aot-2017-0017/aot-2017-0017.xml
dc.source.beginpage203
dc.source.endpage220
dc.source.issue3_4
dc.source.journalAdvanced Optical Technologies
dc.source.volume6
dc.title

EUV mask defectivity – A process of increasing control towards HVM

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
35802.pdf
Size:
1.29 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Articles