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Two-dimensional profiling in silicon using conventional and electrochemical selective etching

Date

1998
Journal article
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dc.contributor.authorTrenkler, Thomas
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorHellemans, L.
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-10-01T09:07:18Z
dc.date.available2021-10-01T09:07:18Z
dc.date.embargo9999-12-31
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3001
dc.source.beginpage349
dc.source.endpage354
dc.source.issue1
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.volume16
dc.title

Two-dimensional profiling in silicon using conventional and electrochemical selective etching

dc.typeJournal article
dspace.entity.typePublication
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