Increasing DOF for VIA lithography using a non-CMP based architecture

dc.contributor.author	Grozev, Grozdan
dc.contributor.author	Waeterloos, Joost
dc.contributor.author	Ronse, Kurt
dc.contributor.author	Van den hove, Luc
dc.contributor.author	Tzviatkov, Plamen
dc.contributor.imecauthor	Grozev, Grozdan
dc.contributor.imecauthor	Ronse, Kurt
dc.contributor.imecauthor	Van den hove, Luc
dc.date.accessioned	2021-09-30T08:21:13Z
dc.date.available	2021-09-30T08:21:13Z
dc.date.issued	1997
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/1905
dc.source.beginpage	249
dc.source.conference	Proceedings Interface '97 Microlithography Symposium;
dc.source.conferencelocation
dc.source.endpage	257
dc.title	Increasing DOF for VIA lithography using a non-CMP based architecture
dc.type	Proceedings paper
dspace.entity.type	Publication
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