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Critical assessment of error budget components in double patterning immersion lithography
Publication:
Critical assessment of error budget components in double patterning immersion lithography
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Date
2008
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hepp, Birgitt
;
Finders, Jo
;
Dusa, Mircea
;
Vleeming, Bert
;
Megens, henry
;
Maenhoudt, Mireille
;
Cheng, Shaunee
;
Vandeweyer, Tom
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1990
since deposited on 2021-10-17
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Acq. date: 2026-01-25
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Views
1990
since deposited on 2021-10-17
1
last month
1
last week
Acq. date: 2026-01-25
Citations