Publication:
Single step alkaline cleaning solution for advanced semiconductor cleaning
Date
| dc.contributor.author | Baeyens, Martien | |
| dc.contributor.author | Hub, W. | |
| dc.contributor.author | Kolbesen, B. O. | |
| dc.contributor.author | Martin, A.R. | |
| dc.contributor.author | Mertens, Paul | |
| dc.contributor.imecauthor | Mertens, Paul | |
| dc.date.accessioned | 2021-09-30T11:25:41Z | |
| dc.date.available | 2021-09-30T11:25:41Z | |
| dc.date.issued | 1998 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2361 | |
| dc.source.conference | 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS | |
| dc.source.conferencedate | 21/09/1998 | |
| dc.source.conferencelocation | Oostende Belgium | |
| dc.title | Single step alkaline cleaning solution for advanced semiconductor cleaning | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |