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Addressing the challenges of Directed Self Assembly implementation

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dc.contributor.authorGronheid, Roel
dc.contributor.authorPollentier, Ivan
dc.contributor.authorYounkin, Todd
dc.contributor.authorSomervell, Mark
dc.contributor.authorNafus, Kathleen
dc.contributor.authorHooge, Josh
dc.contributor.authorRathsack, Ben
dc.contributor.authorScheer, Steven
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorNealy, Paul
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorScheer, Steven
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.accessioned2021-10-19T14:00:40Z
dc.date.available2021-10-19T14:00:40Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19013
dc.source.conferenceInternational Symposium on Lithography Extensions
dc.source.conferencedate20/10/2011
dc.source.conferencelocationMiami, FL USA
dc.title

Addressing the challenges of Directed Self Assembly implementation

dc.typeProceedings paper
dspace.entity.typePublication
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