Publication:

Ab Initio Insights into the Reactivity of Precursors in Atomic Layer Deposition: A Case Study of GeAsSe

 
dc.contributor.authorvan der Linden, Bram
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorNyns, Laura
dc.contributor.authorClima, Sergiu
dc.contributor.authorPeissker, Tobias
dc.contributor.authorDelabie, Annelies
dc.date.accessioned2026-03-12T09:27:08Z
dc.date.available2026-03-12T09:27:08Z
dc.date.createdwos2025-10-25
dc.date.issued2025
dc.description.wosFundingTextThis work was funded by the Strategic Basic Research Fellowship provided by FWO under the project number 1SH9E24N. Figures , , and S4-S7 were created using the freeware ChemSketch software distributed by ACD/Laboratories. We are grateful for the discussions with Sebastiaan Nijs.
dc.identifier.doi10.1021/acs.jpcc.5c05127
dc.identifier.issn1932-7447
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/58824
dc.language.isoeng
dc.provenance.editstepusergreet.vanhoof@imec.be
dc.publisherAMER CHEMICAL SOC
dc.source.beginpage19573
dc.source.endpage19585
dc.source.issue43
dc.source.journalJOURNAL OF PHYSICAL CHEMISTRY C
dc.source.numberofpages13
dc.source.volume129
dc.subject.keywordsFILMS
dc.subject.keywords((CH3)(3)SI)(2)TE
dc.subject.keywordsTELLURIUM
dc.subject.keywordsGETE
dc.title

Ab Initio Insights into the Reactivity of Precursors in Atomic Layer Deposition: A Case Study of GeAsSe

dc.typeJournal article
dspace.entity.typePublication
imec.internal.crawledAt2025-10-22
imec.internal.crawledAt2025-10-22
imec.internal.sourcecrawler
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