Publication:

Role of Intrinsic Electron Trapping in Negative Charging of Amorphous Alumina

 
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0001-5018-4539
cris.virtualsource.department81d20142-643b-4ea2-8f89-390fd699ef91
cris.virtualsource.orcid81d20142-643b-4ea2-8f89-390fd699ef91
dc.contributor.authorStrand, Jack W.
dc.contributor.authorHiorth, Kaja H.
dc.contributor.authorGao, David
dc.contributor.authorAfanasiev, Valeri
dc.contributor.authorAkola, Jaakko
dc.contributor.authorShluger, Alexander L.
dc.contributor.orcidext0000-0001-9037-7095
dc.date.accessioned2026-09-17T08:58:04Z
dc.date.available2026-09-17T08:58:04Z
dc.date.createdwos2026
dc.date.issued2026
dc.description.abstractABSTRACT Negative charging of amorphous alumina (a‐) films is important for many applications, but its nature is not yet fully understood. We investigate whether intrinsic electron traps in a‐ can contribute to film charging before and after high‐temperature anneal. Amorphous and partially crystallized alumina models are created using the melt‐quench approach. Analysis of a large set of models covering a wide range of film densities using hybrid density functional theory shows both spontaneous and activated trapping of electrons in a‐. Spontaneous trapping is found to be more prominent in high‐density, partly crystallized, models. Two types of traps are found: single‐center traps and two‐center traps. In the single‐center case, electrons localize on five‐coordinated Al ions in tetragonal pyramid coordination. Two‐center traps have electron states shared between close Al‐Al pairs. The optical ionization energies of these traps are in the range of 1–4 eV. We discuss these findings in the context of exhaustive photo‐depopulation spectroscopy (EPDS) measurements of trapped electrons in as‐deposited and partially crystallized a‐ films.
dc.description.wosFundingTextJ.S. and A.S. acknowledge support from the EPSRC grant EP/R034540/1 and the computer resources provided by ARCHER2 UK National Supercomputing Service (http://www.archer2.ac.uk) via the membership of the UK's HEC Materials Chemistry Consortium funded by EPSRC (EP/X035859). This work is supported by the Chips JU project ARCTIC (Project #101139908). The project is supported by the Chips Joint Undertaking and its members (including top-up funding by Belgium, Austria, Germany, Estonia, Finland, France, Ireland, The Netherlands and Sweden). ARCTIC gratefully acknowledges the support of the Canadian and the Swiss federal governments. K.H. and J.A. acknowledge supercomputing resources at CSC - IT center for Science (Finland) and Sigma2 - the National Infrastructure for High Performance Computing and Data Storage in Norway (project NN9497K).
dc.identifier.doi10.1002/adfm.202526647
dc.identifier.eissn1616-3028
dc.identifier.issn1616-301X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/60399
dc.language.isoeng
dc.provenance.editstepusergreet.vanhoof@imec.be
dc.publisherWILEY-V C H VERLAG GMBH
dc.source.beginpagee26647
dc.source.issue55
dc.source.journalADVANCED FUNCTIONAL MATERIALS
dc.source.numberofpages10
dc.source.volume36
dc.subject.keywordsTHIN-FILM TRANSISTORS
dc.subject.keywordsBOND-TYPE DEFECTS
dc.subject.keywordsULTRATHIN LAYERS
dc.subject.keywordsAL2O3
dc.subject.keywordsINTERFACE
dc.subject.keywordsSIOX
dc.subject.keywordsZRO2
dc.subject.keywords(100)SI
dc.subject.keywordsIMPACT
dc.title

Role of Intrinsic Electron Trapping in Negative Charging of Amorphous Alumina

dc.typeJournal article
dspace.entity.typePublication
imec.internal.crawledAt2026-06-18
imec.internal.sourcecrawler
imec.internal.wosCreatedAt2026-09-07
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