Publication:
Role of Intrinsic Electron Trapping in Negative Charging of Amorphous Alumina
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0001-5018-4539 | |
| cris.virtualsource.department | 81d20142-643b-4ea2-8f89-390fd699ef91 | |
| cris.virtualsource.orcid | 81d20142-643b-4ea2-8f89-390fd699ef91 | |
| dc.contributor.author | Strand, Jack W. | |
| dc.contributor.author | Hiorth, Kaja H. | |
| dc.contributor.author | Gao, David | |
| dc.contributor.author | Afanasiev, Valeri | |
| dc.contributor.author | Akola, Jaakko | |
| dc.contributor.author | Shluger, Alexander L. | |
| dc.contributor.orcidext | 0000-0001-9037-7095 | |
| dc.date.accessioned | 2026-09-17T08:58:04Z | |
| dc.date.available | 2026-09-17T08:58:04Z | |
| dc.date.createdwos | 2026 | |
| dc.date.issued | 2026 | |
| dc.description.abstract | ||
| dc.description.wosFundingText | J.S. and A.S. acknowledge support from the EPSRC grant EP/R034540/1 and the computer resources provided by ARCHER2 UK National Supercomputing Service (http://www.archer2.ac.uk) via the membership of the UK's HEC Materials Chemistry Consortium funded by EPSRC (EP/X035859). This work is supported by the Chips JU project ARCTIC (Project #101139908). The project is supported by the Chips Joint Undertaking and its members (including top-up funding by Belgium, Austria, Germany, Estonia, Finland, France, Ireland, The Netherlands and Sweden). ARCTIC gratefully acknowledges the support of the Canadian and the Swiss federal governments. K.H. and J.A. acknowledge supercomputing resources at CSC - IT center for Science (Finland) and Sigma2 - the National Infrastructure for High Performance Computing and Data Storage in Norway (project NN9497K). | |
| dc.identifier.doi | 10.1002/adfm.202526647 | |
| dc.identifier.eissn | 1616-3028 | |
| dc.identifier.issn | 1616-301X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/60399 | |
| dc.language.iso | eng | |
| dc.provenance.editstepuser | greet.vanhoof@imec.be | |
| dc.publisher | WILEY-V C H VERLAG GMBH | |
| dc.source.beginpage | e26647 | |
| dc.source.issue | 55 | |
| dc.source.journal | ADVANCED FUNCTIONAL MATERIALS | |
| dc.source.numberofpages | 10 | |
| dc.source.volume | 36 | |
| dc.subject.keywords | THIN-FILM TRANSISTORS | |
| dc.subject.keywords | BOND-TYPE DEFECTS | |
| dc.subject.keywords | ULTRATHIN LAYERS | |
| dc.subject.keywords | AL2O3 | |
| dc.subject.keywords | INTERFACE | |
| dc.subject.keywords | SIOX | |
| dc.subject.keywords | ZRO2 | |
| dc.subject.keywords | (100)SI | |
| dc.subject.keywords | IMPACT | |
| dc.title | Role of Intrinsic Electron Trapping in Negative Charging of Amorphous Alumina | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| imec.internal.crawledAt | 2026-06-18 | |
| imec.internal.source | crawler | |
| imec.internal.wosCreatedAt | 2026-09-07 | |
| Files | Original bundle
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