Publication:

Interface formation in rare-earth oxide containing advanced gate stacks

Date

2008
Presentation
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dc.contributor.authorAdelmann, Christoph
dc.contributor.authorFerain, Isabelle
dc.contributor.authorFranquet, Alexis
dc.contributor.authorConard, Thierry
dc.contributor.authorWitters, Thomas
dc.contributor.authorRichard, Olivier
dc.contributor.authorBender, Hugo
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorKittl, Jorge
dc.contributor.authorVan Elshocht, Sven
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-17T06:13:16Z
dc.date.available2021-10-17T06:13:16Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13281
dc.source.conference15th Workshop on Dielectrics in Microelectronics - WODIM
dc.source.conferencedate23/06/2008
dc.source.conferencelocationBad Saarow Germany
dc.title

Interface formation in rare-earth oxide containing advanced gate stacks

dc.typeOral presentation
dspace.entity.typePublication
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