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Impact of nitridation on recoverable and permanent NBTI degradation in high-k/metal-gate pMOSFETs
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Impact of nitridation on recoverable and permanent NBTI degradation in high-k/metal-gate pMOSFETs
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Date
2008
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Aoulaiche, Marc
;
Kaczer, Ben
;
Roussel, Philippe
;
Houssa, Michel
;
De Gendt, Stefan
;
Maes, Herman
;
Groeseneken, Guido
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1844
since deposited on 2021-10-17
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Acq. date: 2025-12-15
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Metrics
Views
1844
since deposited on 2021-10-17
3
last month
Acq. date: 2025-12-15
Citations