Publication:

Sub 100nm particle removal with deionized water and a megasonic frequency of 835kHz

Date

2002
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorLauerhaas, Jeff
dc.contributor.authorWu, Y.
dc.contributor.authorXu, Kaidong
dc.contributor.authorVereecke, Guy
dc.contributor.authorVos, Rita
dc.contributor.authorKenis, Karine
dc.contributor.authorMertens, Paul
dc.contributor.authorNicolosi, T.
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.accessioned2021-10-14T22:08:57Z
dc.date.available2021-10-14T22:08:57Z
dc.date.embargo9999-12-31
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6519
dc.source.beginpage145
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing VII
dc.source.conferencedate4/09/2001
dc.source.conferencelocationSan Francisco, CA USA
dc.source.endpage146
dc.title

Sub 100nm particle removal with deionized water and a megasonic frequency of 835kHz

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
6049.pdf
Size:
779.45 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions