Publication:

Overview of Ruthenium Thin Films Annealed by Microsecond Scanning UV Pulsed Laser: Structural, Electrical, and Failure Modes Analysis

Date

2025-JAN 7
Journal article
https://doi.org/10.1002/adem.202402656
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dc.contributor.authorDaubriac, Richard
dc.contributor.authorCancellara, Leonardo
dc.contributor.authorChehadi, Zeinab
dc.contributor.authorLu, Lu
dc.contributor.authorThuries, Louis
dc.contributor.authorKhaled, Mohamed Ali
dc.contributor.authorRoze, Fabien
dc.contributor.authorJourdan, Nicolas
dc.contributor.authorTokei, Zsolt
dc.contributor.authorDescamps-Mandine, Armel
dc.contributor.authorHungria, Teresa
dc.contributor.authorFazzini, Pier-Francesco
dc.contributor.authorTabata, Toshiyuki
dc.contributor.authorHuet, Karim
dc.date.accessioned2025-01-14T17:43:18Z
dc.date.available2025-01-14T17:43:18Z
dc.date.issued2025-JAN 7
dc.description.wosFundingTextThe authors gratefully acknowledge funding from the European Union's Horizon 2020 Research and Innovation program under grant agreement no. 875999-2 IT2. This work was supported by the LAAS-CNRS micro- and nanotechnologies platform, a member of the RENATECH French national network. The authors would like to thank the Institute of IMEC, SCREEN-LASSE company (Gennevilliers) and CASTAING microscopy platform (Toulouse) for their network and facilities involving film deposition, laser annealing process, electrical measurements, and TEM observations. The authors also want to recognize Lucie Albert for the help in the electrical modeling using MATLAB programming and numeric computing platform. The authors dedicate this article in loving memory of their friend and colleague Fuccio Cristiano, who passed away in January 2024, for his contribution to the foundation of this project.
dc.identifier.doi10.1002/adem.202402656
dc.identifier.issn1438-1656
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45079
dc.publisherWILEY-V C H VERLAG GMBH
dc.source.journalADVANCED ENGINEERING MATERIALS
dc.source.numberofpages16
dc.subject.keywordsTHERMAL-EXPANSION COEFFICIENT
dc.subject.keywordsATOMIC LAYER DEPOSITION
dc.subject.keywordsYOUNGS MODULUS
dc.subject.keywordsLATTICE-DYNAMICS
dc.subject.keywordsGRAIN-GROWTH
dc.subject.keywordsSILICON
dc.subject.keywordsSTRESS
dc.subject.keywordsMETAL
dc.subject.keywordsDELAMINATION
dc.subject.keywordsTEMPERATURE
dc.title

Overview of Ruthenium Thin Films Annealed by Microsecond Scanning UV Pulsed Laser: Structural, Electrical, and Failure Modes Analysis

dc.typeJournal article
dspace.entity.typePublication
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