Publication:

A way to integrate multiple block layers for middle of line contact patterning

Date

2015
Proceedings Paper
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dc.contributor.authorKunnen, Eddy
dc.contributor.authorDemuynck, Steven
dc.contributor.authorBrouri, Mohand
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorVersluijs, Janko
dc.contributor.authorRyckaert, Julien
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorRyckaert, Julien
dc.date.accessioned2021-10-22T20:17:21Z
dc.date.available2021-10-22T20:17:21Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25502
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2209862
dc.source.beginpage94280W
dc.source.conferenceAdvanced Etch Technology for Nanopattering IV
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.title

A way to integrate multiple block layers for middle of line contact patterning

dc.typeProceedings paper
dspace.entity.typePublication
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