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Growth and physical properties of MOCVD-deposited hafnium oxide films and their properties on silicon
Publication:
Growth and physical properties of MOCVD-deposited hafnium oxide films and their properties on silicon
Date
2003
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Van Elshocht, Sven
;
Caymax, Matty
;
De Gendt, Stefan
;
Conard, Thierry
;
Petry, Jasmine
;
Claes, Martine
;
Witters, Thomas
;
Zhao, Chao
;
Brijs, Bert
;
Richard, Olivier
;
Bender, Hugo
;
Vandervorst, Wilfried
;
Carter, Richard
;
Kluth, Jon
;
Daté, L.
;
Pique, D.
;
Heyns, Marc
Journal
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1
since deposited on 2021-10-15
Acq. date: 2025-10-23
Views
1947
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
Metrics
Downloads
1
since deposited on 2021-10-15
Acq. date: 2025-10-23
Views
1947
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations