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Study of ion and VUV effects on self-assembled organic low-k material exposed to argon plasma

Date

2012
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dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorLjazouli, Rami
dc.contributor.authorSouriau, Laurent
dc.contributor.authorZhang, Liping
dc.contributor.authorLee, Hsiang-Yun
dc.contributor.authorWilson, Chris
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorWilson, Chris
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.date.accessioned2021-10-20T10:32:25Z
dc.date.available2021-10-20T10:32:25Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20549
dc.source.beginpageC2.9
dc.source.conferenceMRS Spring Meeting Symposium C: Interconnect Challenges for CMOS Technology
dc.source.conferencedate9/04/2012
dc.source.conferencelocationSan Francisco, CA USA
dc.title

Study of ion and VUV effects on self-assembled organic low-k material exposed to argon plasma

dc.typeMeeting abstract
dspace.entity.typePublication
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