Publication:

The limitation and optimization of bottom-up growth mode in through silicon via electroplating

Date

2015
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorYang, Liu
dc.contributor.authorRadisic, Alex
dc.contributor.authorDeconinck, Johan
dc.contributor.authorVereecken, Philippe
dc.contributor.imecauthorRadisic, Alex
dc.contributor.imecauthorVereecken, Philippe
dc.contributor.orcidimecVereecken, Philippe::0000-0003-4115-0075
dc.date.accessioned2021-10-23T01:20:07Z
dc.date.available2021-10-23T01:20:07Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26213
dc.identifier.urlhttp://jes.ecsdl.org/content/162/14/D599.full?sid=37180e73-fa95-455b-ae81-4a17a996d13d
dc.source.beginpageD599
dc.source.endpageD604
dc.source.issue14
dc.source.journalJournal of the Electrochemical Society
dc.source.volume162
dc.title

The limitation and optimization of bottom-up growth mode in through silicon via electroplating

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
31746.pdf
Size:
808.07 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Articles