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RPN oxynitride gate dielectrics for 90nm low power CMOS applications
Publication:
RPN oxynitride gate dielectrics for 90nm low power CMOS applications
Date
2002
Proceedings Paper
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6310.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Veloso, Anabela
;
Jurczak, Gosia
;
Cubaynes, Florence
;
Rooyackers, Rita
;
Mertens, Sofie
;
Rothschild, Aude
;
Schaekers, Marc
;
Al-Shareef, H.
;
Murto, R.
;
Dachs, Charles
;
Badenes, Gonçal
Journal
Abstract
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2013
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
2013
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations