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Capacitance measurements and K-value extractions of low-K films

Date

2010
Journal article
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dc.contributor.authorCiofi, Ivan
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBeyer, Gerald
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.date.accessioned2021-10-18T15:35:52Z
dc.date.available2021-10-18T15:35:52Z
dc.date.issued2010
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16870
dc.identifier.urlhttp://dx.doi.org/10.1016/j.mee.2010.04.014
dc.source.beginpage2391
dc.source.endpage2406
dc.source.issue11
dc.source.journalMicroelectronic Engineering
dc.source.volume87
dc.title

Capacitance measurements and K-value extractions of low-K films

dc.typeJournal article
dspace.entity.typePublication
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