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Impact of sequential infiltration synthesis on pattern fidelity of DSA lines

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dc.contributor.authorSingh, Arjun
dc.contributor.authorKnaepen, Werner
dc.contributor.authorSayan, Safak
dc.contributor.authorEl Otell, Ziad
dc.contributor.authorChan, BT
dc.contributor.authorMaes, Jan
dc.contributor.authorGronheid, Roel
dc.contributor.imecauthorSingh, Arjun
dc.contributor.imecauthorKnaepen, Werner
dc.contributor.imecauthorEl Otell, Ziad
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.date.accessioned2021-10-22T22:57:58Z
dc.date.available2021-10-22T22:57:58Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25918
dc.identifier.urlhttps://doi.org/10.1117/12.2086091
dc.source.beginpage94250N
dc.source.conferenceAdvances in Patterning Materials and Processes XXXII
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.title

Impact of sequential infiltration synthesis on pattern fidelity of DSA lines

dc.typeProceedings paper
dspace.entity.typePublication
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