Phase analysis and thermal stability of thin films synthesized via solid state reaction of Ni with Si1-xGex substrate

dc.contributor.author	Peter, Antony
dc.contributor.author	Witters, Thomas
dc.contributor.author	Dutta, Shibesh
dc.contributor.author	Hikavyy, Andriy
dc.contributor.author	Vaesen, Inge
dc.contributor.author	Van Elshocht, Sven
dc.contributor.author	Schaekers, Marc
dc.contributor.imecauthor	Peter, Antony
dc.contributor.imecauthor	Witters, Thomas
dc.contributor.imecauthor	Hikavyy, Andriy
dc.contributor.imecauthor	Vaesen, Inge
dc.contributor.imecauthor	Van Elshocht, Sven
dc.contributor.imecauthor	Schaekers, Marc
dc.contributor.orcidimec	Hikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimec	Van Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimec	Schaekers, Marc::0000-0002-1496-7816
dc.date.accessioned	2021-10-23T13:37:57Z
dc.date.available	2021-10-23T13:37:57Z
dc.date.issued	2016
dc.identifier.issn	0167-9317
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/27131
dc.identifier.url	http://www.sciencedirect.com/science/article/pii/S016793171530054X
dc.source.beginpage	46
dc.source.endpage	51
dc.source.journal	Microelectronic Engineering
dc.source.volume	149
dc.title	Phase analysis and thermal stability of thin films synthesized via solid state reaction of Ni with Si1-xGex substrate
dc.type	Journal article
dspace.entity.type	Publication
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