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Effects of Al2O3 dielectric cap and nitridation on device performance, scalability, and reliability for advanced high-k/metal gate pMOSFET applications
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1910 since deposited on 2021-10-16
1last month
Acq. date: 2026-04-06
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Views
1910 since deposited on 2021-10-16
1last month
Acq. date: 2026-04-06
Citations