Publication:
Properties of porous HSQ-based films capped by plasma enhanced chemical vapor deposition dielectric layers
Date
| dc.contributor.author | Iacopi, Francesca | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.contributor.author | Sleeckx, Erik | |
| dc.contributor.author | Conrad, T. | |
| dc.contributor.author | Bender, Hugo | |
| dc.contributor.author | Meynen, Herman | |
| dc.contributor.author | Maex, Karen | |
| dc.contributor.imecauthor | Sleeckx, Erik | |
| dc.contributor.imecauthor | Bender, Hugo | |
| dc.contributor.imecauthor | Maex, Karen | |
| dc.contributor.orcidimec | Sleeckx, Erik::0000-0003-2560-6132 | |
| dc.date.accessioned | 2021-10-14T21:51:45Z | |
| dc.date.available | 2021-10-14T21:51:45Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6417 | |
| dc.source.beginpage | 109 | |
| dc.source.endpage | 115 | |
| dc.source.issue | 1 | |
| dc.source.journal | Journal of Vacuum Science & Technology B | |
| dc.source.volume | 20 | |
| dc.title | Properties of porous HSQ-based films capped by plasma enhanced chemical vapor deposition dielectric layers | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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