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Particle emission from chemically enhanced electron-beam-induced etching of Si: An approach for zero-energy secondary-ion mass spectrometry
Publication:
Particle emission from chemically enhanced electron-beam-induced etching of Si: An approach for zero-energy secondary-ion mass spectrometry
Date
2009
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vanhove, Nico
;
Lievens, Peter
;
Vandervorst, Wilfried
Journal
Physical Review B
Abstract
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1843
since deposited on 2021-10-18
409
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Acq. date: 2025-10-25
Citations
Metrics
Views
1843
since deposited on 2021-10-18
409
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations