Publication:

Advanced channel materials for the semiconductor industry

Date

2015
Proceedings Paper
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dc.contributor.authorCollaert, Nadine
dc.contributor.authorAlian, AliReza
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorBoccardi, Guillaume
dc.contributor.authorEneman, Geert
dc.contributor.authorLin, Dennis
dc.contributor.authorMitard, Jerome
dc.contributor.authorSioncke, Sonja
dc.contributor.authorWaldron, Niamh
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorZhou, Daisy
dc.contributor.authorThean, Aaron
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorAlian, AliReza
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorBoccardi, Guillaume
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorLin, Dennis
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorWaldron, Niamh
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorZhou, Daisy
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecBoccardi, Guillaume::0000-0003-3226-4572
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.date.accessioned2021-10-22T18:43:58Z
dc.date.available2021-10-22T18:43:58Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25094
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7333542
dc.source.beginpage1
dc.source.conferenceIEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference - S3S
dc.source.conferencedate4/10/2015
dc.source.conferencelocationRohnert Park, CA USA
dc.source.endpage5
dc.title

Advanced channel materials for the semiconductor industry

dc.typeProceedings paper
dspace.entity.typePublication
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