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Area scaling of planar ferromagnetic tunnel junctions: from shadow evaporation to lithographic microfabrication

Date

1998
Journal article
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dc.contributor.authorBoeve, Hans
dc.contributor.authorvan de Veerdonk, R. J. M.
dc.contributor.authorDutta, Barundeb
dc.contributor.authorDe Boeck, Jo
dc.contributor.authorMoodera, J. S.
dc.contributor.authorBorghs, Gustaaf
dc.contributor.imecauthorDutta, Barundeb
dc.contributor.imecauthorDe Boeck, Jo
dc.contributor.imecauthorBorghs, Gustaaf
dc.date.accessioned2021-09-30T11:29:54Z
dc.date.available2021-09-30T11:29:54Z
dc.date.embargo9999-12-31
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2412
dc.source.beginpage6700
dc.source.endpage6702
dc.source.issue11
dc.source.journalJournal of Applied Physics
dc.source.volume83
dc.title

Area scaling of planar ferromagnetic tunnel junctions: from shadow evaporation to lithographic microfabrication

dc.typeJournal article
dspace.entity.typePublication
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