Publication:

Use of high order precursors for manufacturing Gate all around devices

Date

2017
Journal article
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dc.contributor.authorHikavyy, Andriy
dc.contributor.authorZyulkov, Ivan
dc.contributor.authorMertens, Hans
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorLoo, Roger
dc.contributor.authorHoriguchi, Naoto
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorZyulkov, Ivan
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-24T05:47:08Z
dc.date.available2021-10-24T05:47:08Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.issn1369-8001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28515
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S136980011630484X
dc.source.beginpage24
dc.source.endpage29
dc.source.journalMaterials Science in Semiconductor Processing
dc.source.volume70
dc.title

Use of high order precursors for manufacturing Gate all around devices

dc.typeJournal article
dspace.entity.typePublication
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