Publication:
The influence of barrier slurry selectivity on the design window for copper CMP
Date
| dc.contributor.author | Kim, Hoyouny | |
| dc.contributor.author | Vaes, Jan | |
| dc.contributor.author | Li, Yunlong | |
| dc.contributor.author | Leunissen, Peter | |
| dc.contributor.imecauthor | Li, Yunlong | |
| dc.contributor.orcidimec | Li, Yunlong::0000-0003-4791-4013 | |
| dc.date.accessioned | 2021-10-17T07:59:23Z | |
| dc.date.available | 2021-10-17T07:59:23Z | |
| dc.date.issued | 2008 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13949 | |
| dc.source.conference | International Conference on Planarization/CMP Technology | |
| dc.source.conferencedate | 10/11/2008 | |
| dc.source.conferencelocation | Taipei Taiwan | |
| dc.title | The influence of barrier slurry selectivity on the design window for copper CMP | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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