Optically enhanced i-line lithography for 0.3-μm random logic applications

dc.contributor.author	Yen, Anthony
dc.contributor.author	Tzviatkov, Plamen
dc.contributor.author	Grozev, Grozdan
dc.contributor.imecauthor	Grozev, Grozdan
dc.date.accessioned	2021-09-29T15:57:16Z
dc.date.available	2021-09-29T15:57:16Z
dc.date.embargo	9999-12-31
dc.date.issued	1996
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/1679
dc.source.beginpage	S13
dc.source.endpage	S19
dc.source.issue	March
dc.source.journal	Solid State Technology
dc.source.volume	39
dc.title	Optically enhanced i-line lithography for 0.3-μm random logic applications
dc.type	Journal article
dspace.entity.type	Publication
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