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Measurement technology to quantify 2D pattern shape in sub-2xnm advanced lithography
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Measurement technology to quantify 2D pattern shape in sub-2xnm advanced lithography
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Date
2013
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Fuchimoto, Daisuke
;
Sakai, H.
;
Shindo, H.
;
Izawa, M.
;
Sugahara, H.
;
Van de Kerkhove, Jeroen
;
De Bisschop, Peter
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Acq. date: 2025-12-11
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Views
1902
since deposited on 2021-10-21
1
last month
Acq. date: 2025-12-11
Citations