Publication:

Phosphorus doped Ge layers for optical applications

Date

2016
Meeting abstract
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dc.contributor.authorSrinivasan, Ashwyn
dc.contributor.authorPrabhulinga, Ashwini
dc.contributor.authorPorret, Clément
dc.contributor.authorShimura, Yosuke
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorLoo, Roger
dc.contributor.authorVan Campenhout, Joris
dc.contributor.imecauthorSrinivasan, Ashwyn
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorVan Campenhout, Joris
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecVan Campenhout, Joris::0000-0003-0778-2669
dc.date.accessioned2021-10-23T15:11:31Z
dc.date.available2021-10-23T15:11:31Z
dc.date.embargo9999-12-31
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27346
dc.source.beginpage15
dc.source.conferenceJSPS - FZ-Jülich Workshop on "Atomically Controlled Processing for Ultra-large Scale Integration"
dc.source.conferencedate24/11/2016
dc.source.conferencelocationJülich Germany
dc.source.endpage16
dc.title

Phosphorus doped Ge layers for optical applications

dc.typeMeeting abstract
dspace.entity.typePublication
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