Publication:
In-line monitoring of acid and base contaminants at low pptlevels for 193nm lithography
Date
| dc.contributor.author | Gronheid, Roel | |
| dc.contributor.author | Al-Horr, Rida | |
| dc.contributor.imecauthor | Gronheid, Roel | |
| dc.date.accessioned | 2021-10-16T01:50:21Z | |
| dc.date.available | 2021-10-16T01:50:21Z | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10528 | |
| dc.source.beginpage | 1591 | |
| dc.source.conference | Optical Microlithography XVIII | |
| dc.source.conferencedate | 27/02/2005 | |
| dc.source.conferencelocation | San Jose, CA USA | |
| dc.source.endpage | 1600 | |
| dc.title | In-line monitoring of acid and base contaminants at low pptlevels for 193nm lithography | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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