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High absorption contrast quantum confined stark effect in ultra-thin Ge/SiGe quantum well stacks grown on si

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dc.contributor.authorSrinivasan, Ashwyn
dc.contributor.authorPorret, Clément
dc.contributor.authorVissers, Ewoud
dc.contributor.authorFavia, Paola
dc.contributor.authorDe Coster, Jeroen
dc.contributor.authorBender, Hugo
dc.contributor.authorLoo, Roger
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorVan Campenhout, Joris
dc.contributor.authorPantouvaki, Marianna
dc.contributor.imecauthorSrinivasan, Ashwyn
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorVissers, Ewoud
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorDe Coster, Jeroen
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.imecauthorVan Campenhout, Joris
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.contributor.orcidimecVissers, Ewoud::0000-0002-5765-0552
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.contributor.orcidimecVan Campenhout, Joris::0000-0003-0778-2669
dc.date.accessioned2021-10-29T04:44:30Z
dc.date.available2021-10-29T04:44:30Z
dc.date.embargo9999-12-31
dc.date.issued2020-02
dc.identifier.issn0018-9197
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36007
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8883247
dc.source.beginpage5200207
dc.source.issue1
dc.source.journalIEEE Journal of Quantum Electronics
dc.source.volume56
dc.title

High absorption contrast quantum confined stark effect in ultra-thin Ge/SiGe quantum well stacks grown on si

dc.typeJournal article
dspace.entity.typePublication
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