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Growth mechanisms of interfacial carbon layers at the epitaxial Al2O3(0001)/Cu(111) interface as application for epitaxial film lift-off

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dc.contributor.authorTsai, Hung-Chieh
dc.contributor.authorMarien, Brecht
dc.contributor.authorChancerel, Francois
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBrems, Steven
dc.contributor.imecauthorTsai, Hung-Chieh
dc.contributor.imecauthorMarien, Brecht
dc.contributor.imecauthorChancerel, Francois
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorBrems, Steven
dc.contributor.orcidimecTsai, Hung-Chieh::0000-0001-6654-4885
dc.contributor.orcidimecChancerel, Francois::0000-0003-4512-1634
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecBrems, Steven::0000-0002-0282-8528
dc.date.accessioned2023-08-02T09:39:36Z
dc.date.available2023-06-26T20:41:51Z
dc.date.available2023-07-10T15:19:08Z
dc.date.available2023-08-02T09:39:36Z
dc.date.embargo9999-12-31
dc.date.issued2023
dc.description.wosFundingTextThis project has received funding from the European Union's Horizon 2020 research and innovation programme under Grant Agreement No. 881603.
dc.identifier.doi10.1116/6.0002568
dc.identifier.issn0734-2101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42099
dc.publisherA V S AMER INST PHYSICS
dc.source.beginpageArt. 042201
dc.source.endpagena
dc.source.issue4
dc.source.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
dc.source.numberofpages9
dc.source.volume41
dc.subject.keywordsSINGLE-CRYSTAL GRAPHENE
dc.subject.keywordsCU
dc.subject.keywordsDIFFUSION
dc.title

Growth mechanisms of interfacial carbon layers at the epitaxial Al2O3(0001)/Cu(111) interface as application for epitaxial film lift-off

dc.typeJournal article
dspace.entity.typePublication
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