Publication:

Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy

Date

2014
Presentation
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dc.contributor.authorBekaert, Joost
dc.contributor.authorGronheid, Roel
dc.contributor.authorMKuppuswamy, Vijaya Kumar
dc.contributor.authorDoise, Jan
dc.contributor.authorChan, BT
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorSayan, Safak
dc.contributor.authorCao, Yi
dc.contributor.authorHer, YoungJun
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorDoise, Jan
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorHer, YoungJun
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.date.accessioned2021-10-22T00:45:31Z
dc.date.available2021-10-22T00:45:31Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23530
dc.source.conferencePhotomask Technology (BACUS 2014)
dc.source.conferencedate16/09/2014
dc.source.conferencelocationMonterey, CA USA
dc.title

Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy

dc.typeOral presentation
dspace.entity.typePublication
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