Optical lithography techniques for  0.25 μm and below: CD control issues

dc.contributor.author	Van den hove, Luc
dc.contributor.author	Ronse, Kurt
dc.contributor.author	Pforr, Rainer
dc.contributor.imecauthor	Van den hove, Luc
dc.contributor.imecauthor	Ronse, Kurt
dc.contributor.orcidimec	Ronse, Kurt::0000-0003-0803-4267
dc.date.accessioned	2021-09-29T13:18:44Z
dc.date.available	2021-09-29T13:18:44Z
dc.date.embargo	9999-12-31
dc.date.issued	1995
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/931
dc.source.beginpage	24
dc.source.conference	International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers
dc.source.conferencedate	31/05/1995
dc.source.conferencelocation
dc.source.endpage	30
dc.title	Optical lithography techniques for 0.25 μm and below: CD control issues
dc.type	Proceedings paper
dspace.entity.type	Publication
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