Publication:

Progress on background signal analysis of bare wafer inspection systems based on light scattering for III/V epitaxial growth monitoring

Date

2014
Proceedings Paper
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dc.contributor.authorHalder, Sandip
dc.contributor.authorMols, Yves
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorVan Puymbroeck, Jan
dc.contributor.authorCaymax, Matty
dc.contributor.authorVancoille, Eric
dc.contributor.authorNieuborg, Nancy
dc.contributor.authorBast, Gerhard
dc.contributor.authorSimpson, Gavin
dc.contributor.authorPeikert, Milko
dc.contributor.authorPolli, Marco
dc.contributor.authorUlea, Neli
dc.contributor.authorSeong, Ho Yoo
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorMols, Yves
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorVan Puymbroeck, Jan
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorVancoille, Eric
dc.contributor.imecauthorBast, Gerhard
dc.contributor.imecauthorSimpson, Gavin
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.accessioned2021-10-22T01:49:47Z
dc.date.available2021-10-22T01:49:47Z
dc.date.embargo9999-12-31
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23901
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=&arnumber=6847022&contentType=Conference+Publications
dc.source.beginpage283
dc.source.conference25th Annual SEMI Advanced Semiconductor Manufacturing Conference - ASMC
dc.source.conferencedate19/05/2014
dc.source.conferencelocationSaratoga Springs, NY USA
dc.source.endpage287
dc.title

Progress on background signal analysis of bare wafer inspection systems based on light scattering for III/V epitaxial growth monitoring

dc.typeProceedings paper
dspace.entity.typePublication
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