Publication:

Unveiling surface reactivity: the crucial role of auxiliary ligands in gallium amidinate-based precursors for atomic layer deposition

Date

2025
Journal article
https://doi.org/10.1039/d4dt03498h
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dc.contributor.authorPugliese, Eva
dc.contributor.authorCoutancier, Damien
dc.contributor.authorPavard, Paul-Alexis
dc.contributor.authorHervochon, Julien
dc.contributor.authorvan der Linden, Bram
dc.contributor.authorCasaretto, Nicolas
dc.contributor.authorBourcier, Sophie
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorBouttemy, Muriel
dc.contributor.authorAuffrant, Audrey
dc.contributor.authorSchneider, Nathanaelle
dc.contributor.imecauthorvan der Linden, Bram
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.orcidimecvan der Linden, Bram::0000-0002-9948-381X
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.date.accessioned2025-03-18T12:57:14Z
dc.date.available2025-03-10T19:09:39Z
dc.date.available2025-03-18T12:57:14Z
dc.date.issued2025
dc.description.wosFundingTextThis work was supported by the French Agence Nationale de la Recherche under contract number HANAMI ANR-17-CE09-0022. This work has been partly carried out at the Energy4Climate Interdisciplinary Center (E4C) of IP Paris and Ecole des Ponts ParisTech, which is in part supported by the 3rd Programme d'Investissements d'Avenir [ANR-18-EUR-0006-02], and by the Foundation of Ecole polytechnique (Chaire "Defis Technologiques pour une Energie Responsable" financed by Total Energies) for E. P. The authors also want to thank FWO for providing the Strategic Basic Research Fellowship under project number 1SH9E24N for B. v. d. L. The authors thank CNRS and Ecole polytechnique for hosting the project.
dc.identifier.doi10.1039/d4dt03498h
dc.identifier.issn1477-9226
dc.identifier.pmidMEDLINE:40028889
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45374
dc.publisherROYAL SOC CHEMISTRY
dc.source.beginpage5182
dc.source.endpage5191
dc.source.issue-
dc.source.journalDALTON TRANSACTIONS
dc.source.numberofpages10
dc.source.volume54
dc.subject.disciplineChemistry
dc.subject.keywordsALD
dc.subject.keywordsH2O
dc.subject.keywordsH2S
dc.subject.keywordsDFT
dc.subject.keywordsSynthesis
dc.subject.keywordsGa2O3 films
dc.subject.keywordsGa2S3 films
dc.subject.keywordsGallium amidinate precursors
dc.subject.keywordsOxide thin films
dc.title

Unveiling surface reactivity: the crucial role of auxiliary ligands in gallium amidinate-based precursors for atomic layer deposition

dc.typeJournal article
dspace.entity.typePublication
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