Publication:
Front end of the line process
Date
| dc.contributor.author | Han, Jeong Hwan | |
| dc.contributor.author | Cho, Moon Ju | |
| dc.contributor.author | Delabie, Annelies | |
| dc.contributor.author | Park, Tae Joo | |
| dc.contributor.author | Hwang, cheol seong | |
| dc.contributor.imecauthor | Delabie, Annelies | |
| dc.date.accessioned | 2021-10-22T01:50:03Z | |
| dc.date.available | 2021-10-22T01:50:03Z | |
| dc.date.issued | 2014 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/23902 | |
| dc.source.beginpage | 175 | |
| dc.source.book | Atomic Layer Deposition for Modern Semiconductor Devices | |
| dc.source.endpage | 208 | |
| dc.title | Front end of the line process | |
| dc.type | Book chapter | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |