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Estimation of evaporating water film thickness during different drying processes

Date

2001
Meeting abstract
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dc.contributor.authorFyen, Wim
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorMertens, Paul
dc.contributor.authorLauerhaas, Jeff
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.date.accessioned2021-10-14T16:57:04Z
dc.date.available2021-10-14T16:57:04Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5303
dc.source.conference200th Meeting of the Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device Manufac
dc.source.conferencedate2/09/2001
dc.source.conferencelocationSan Francisco, CA USA
dc.title

Estimation of evaporating water film thickness during different drying processes

dc.typeMeeting abstract
dspace.entity.typePublication
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