Publication:

Calibrated PSCAR stochastic simulation

Date

2019
Proceedings Paper
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dc.contributor.authorDinh, Cong Que
dc.contributor.authorNagahara, Seji
dc.contributor.authorShiraishi, Gousuke
dc.contributor.authorMinekawa, Yukie
dc.contributor.authorKamei, Yuya
dc.contributor.authorCarcasi, Michael
dc.contributor.authorIde, Hiroyuki
dc.contributor.authorKondo, Yoshihiro
dc.contributor.authorYoshida, Yuichi
dc.contributor.authorYoshihara, Kosuke
dc.contributor.authorShimada, Ryo
dc.contributor.authorTomono, Masaru
dc.contributor.authorMoriya, Teruhiko
dc.contributor.authorTakeshita, Kazuhiro
dc.contributor.authorNafus, Kathleen
dc.contributor.authorBiesemans, Serge
dc.contributor.authorPetersen, John
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorFoubert, Philippe
dc.contributor.authorDe Bisschop, Peter
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorPetersen, John
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2021-10-27T08:54:14Z
dc.date.available2021-10-27T08:54:14Z
dc.date.embargo9999-12-31
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32906
dc.identifier.urlhttps://doi.org/10.1117/12.2515183
dc.source.beginpage109571O
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography X
dc.source.conferencedate24/02/2019
dc.source.conferencelocationSan Jose, CA USA
dc.title

Calibrated PSCAR stochastic simulation

dc.typeProceedings paper
dspace.entity.typePublication
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